Technology Data · No.15

주요 반도체용 특수가스의 종류 및 특성

2005-06-09

주요 반도체용 특수가스의 종류 및 특성

종류몰중량냄새공기중 발화력(%)독성(ppm)부식성
SiH₄32.118불쾌한 냄새자연발화 1.35~5×
SiF₄104.08자극적 냄새비연소성2.5(㎎F)/㎥
PH₃34고기썩는 냄새자연발화 1.32~0.3×
BF₃67.82자극적 냄새비연소성0.3
NF₃71무취지연성10×
SF₆146.05무취비연소성1000×
WF₆279.84자극적 냄새비연소성2.5(F)/㎥
HCl36.46자극적 냄새비연소성5
C₂F₆138.012무취비연소성-×
ClF₃92.45불쾌한 냄새지연성0.1
NH₃17.03자극적 냄새지연성 15.5~2725

Silicon Precursor Gases

Dichlorosilane (SiH₂Cl₂), Disilane (Si₂H₆), Germane (GeH₄), Germanium Tetrafluoride (GeF₄), Methylsilane (SiH₃CH₃), Silane (SiH₄), Silicon Tetrachloride (SiCl₄), Silicon Tetrafluoride (SiF₄), Trichlorosilane (SiHCl₃)

Dopant Gases

Arsine (AsH₃), Boron Trifluoride (BF₃), Boron-11 Trifluoride (¹¹BF₃), Diborane (B₂H₆), Phosphine (PH₃), Trimethylboron (B(CH₃)₃)

Atmospheric Gases

Argon (Ar), Helium (He), Hydrogen (H₂), Nitrogen (N₂), Oxygen (O₂), Xenon (Xe)

Reactant Gases

Ammonia (NH₃), Carbon Dioxide (CO₂), Carbon Monoxide (CO), Nitrous Oxide (N₂O), Sulfur Dioxide (SO₂), Tungsten Hexafluoride (WF₆)

Etchant Gases

Boron Trichloride (BCl₃), Chlorine (Cl₂), Chlorine Trifluoride (ClF₃), CF₄, CHF₃, CH₂F₂, CH₃F, C₂F₆, C₂HF₅, C₃F₈, C₄F₈, Hydrogen Bromide (HBr), Hydrogen Chloride (HCl), Hydrogen Fluoride (HF), Nitrogen Trifluoride (NF₃), Sulfur Hexafluoride (SF₆)