Home > 기술자료실   ▣ 주요 반도체용 특수가스의 종류및 특성 종류 몰중량 냄새 공기중 발화력(%) 독성(ppm) 부식성 SiH4 32.118 불쾌한냄새 자연발화 1.35~ ○ 5 x SiF4 104.08 자극적 냄새 비연소성 - o 2.5(㎎F)/㎥ o PH3 34 고기썩는냄새 자연발화 1.32~ o 0.3 x BF3 67.82 자극적 냄새 비연소성 - o 0.3 o NF3 71 무취 지연성 - o 10 x SF3 146.05 무취 비연소성 - x 1000 x WF6 279.84 자극적 냄새 비연소성 - o 2.5(F)/㎥ o HCI 36.46 자극적 냄새 비연소성 - o 5 o C2F6 138.012 무취 비연소성 - x   x CIF3 92.45 불쾌한 냄새 지연성 - o 0.1 o NH3 17.03 자극적 냄새 지연성 15.5~27 o 25 o Silicon Precursor Gases Dopant Gases Dichlorosilane, SiH2Cl2 Disilane, Si2H6 Germane, GeH4 Germanium Tetrafluoride, GeF4 Methylsilane, SiH3CH3 Silane, SiH4 Silicon Tetrachloride, SiCl4 Silicon Tetrafluoride, SiF4 Trichlorosilane, SiHCl3 Arsine, AsH3 Boron Trifluoride, BF3 Boron-11Trifluoride, (enriched) 11BF3 Diborane, B2 H6 Phosphine, PH3 Trimethylboron, B(CH3)3 Atmospheric Gases Reactant Gases Argon, Ar Helium, He Hydrogen, H2 Nitrogen, N2 Oxygen, O2 Xenon, Xe Ammonia, NH3 Carbon Dioxide, CO2 Carbon Monoxide, CO Nitrous Oxide, N2O Sulfur Dioxide, SO2 Tungsten Hexafluoride, WF6 Etchant Gases (Laser) 1% Fluorine, 1.25% Krypton, Balance Neon 1.2% Krypton, Balance Neon Etchant Gases Boron Trichloride, BCl3 Chlorine, Cl2 Chlorine Trifluoride, ClF3 Halocarbon 14, CF4 Halocarbon 23, CHF3 Halocarbon 32, CH2 F2 Halocarbon 41, CH3F Halocarbon 116, C2 F6 Halocarbon 125, C2HF5 Halocarbon 218, C3 F8 Halocarbon C318, C4 F8 Hydrogen Bromide, HBr Hydrogen Chloride, HCl Hydrogen Fluoride, HF Nitrogen Trifluoride, NF3 Sulfur Hexafluoride, SF6